First-ever LDMOS with Retrograde Body - also in 110nm BCD on SOI
Rsp = 0.84 mOhm.mm2 for 12V breakdown
Silicon confirms the Hybrid Source is the smallest possible source region
at any BCD node to minimize Rsp and cost.
==> Scales with "contact spacing rules"
Silicon confirms the transparent process simplicity - no N+ source implant
Enhance SOA (100ns TLP) over full voltage range (12V - 125V rated)
Fast Transient immunity confirmed with 2.5ns TLP
Leveraging the enhanced SOA (no snapback) and power-to-failure (Fast Transient immunity) benefits to optimize drain engineering for BV = 125V.
+68% increase without compromising device characteristics
Enhanced ESD robustness confirmed with 2.5ns TLP
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